Gas Cluster Ion Beam (GCIB) System
This GCIB device has a three-chamber structure as a standard machine, and since the cluster generation / ionization and electrostatic lens / monomer removal functions are housed independently of the process chamber, it is not exposed to the atmosphere when opening and closing the process chamber. Stable operation can be expected for a long period of time.
IBS (Ion Beam Sputtering) System
This IBS device is an IBS film forming device equipped with two large (~ 16 cm grit) RF ion sources and capable of ion-assisted film formation. With a highly complete device based on our long experience, it is possible to form an optical multilayer film with arbitrary filter characteristics by forming a high-quality optical multilayer film and using a high-precision optical monitor and high-precision film formation control. The field of application is suitable for the formation and production of ultra-low loss, high resistance optical thin films from difficult optical communication filters.
